Multipurpose deposition system
- Thermal sputtering from three independent resistive-heated evaporators rigged by protecting movable defense screens.
- Rich magazine is completed by different basket, spiral and effusion-type evaporators;
- “Flash”-sputtering from two independent sources with the use of electromagnetic controllNanomaterials processing & Plasma
- Polymerizationer for material batch preparation;
- DC/RF-magnetron sputtering (300 VA) from 3 independent magnetrons using target of convenient size (< 40 mm ΓΈ);
- Electron-beam evaporation;
- Ion-plasma sputtering (350 VA);
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RF-plasma reactor
Designed for FIA – into a plasma stream
- Nanoparticles synthesis
- Inorgani style=”font-weight: bold; text-decoration: underline;”c copolymers
- Hydride synthesis
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DC-plasma reactor
- Plasma polymerization
- Thin polymer films deposition
- Liquid monomer injection
- Thin film nanocomposites
- A new version with FIA system is in development
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Heater – 1600 C, controlled atmosphere
(in acquisition 2008) |
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| Photoresist processing |
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| Thermo centrifugal processing |
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| Electrospinning |
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